Photoflow reactor LX-1 availabe for gas-luqid biphasic reactions

A new flow reactor system, MiChS LX-1 (Patented), enables gas-liquid two-phase reaction under photoirradiation.  High-power LEDs are provided for LX-1.  All the photo reactor parts are made of quartz glass mounted on a stainless-steel frame.  The cooling channel is embedded in the metal frame part.   Both gas and liquid have no chance of contact with metal parts, enabling the use of corrosive gas, such as HCl and Cl2.  MiChS LX-1, having a 60 cm length,  is compatible with numbering-up, making it a specification for continuous flow production.